HOFER, DONALD C.: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

Don't use scam websites

1

Analysis of habitat use by and preference of elephants in the Selous-Niassa wildlife corridor, southern Tanzania

Donald Gregory Mpanduji, Marion East, Heribert Hofer

Journal:

African Journal of Ecology

Year:

2009

Language:

english

File:

PDF, 51 KB

english, 2009

2

Top Management's Role in Strategic Planning

LAMB, ROBERT, HOFER, CHUCK, Melville, Donald R.

Journal:

Journal of Business Strategy

Year:

1981

Language:

english

File:

PDF, 211 KB

english, 1981

3

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Optimization of ESCAP photoresist for x-ray lithography

Pomerene, Andrew T., Petrillo, Karen E., Seeger, David E., Ito, Hiroshi, Breyta, Gregory, Hofer, Donald C., Patterson, David O.

Year:

1994

Language:

english

File:

PDF, 506 KB

english, 1994

4

Design of a positive resist for projection lithography in the mid-UV

Grant Willson, Robert Miller, Dennis McKean, Nicholas Clecak, Terry Tompkins, Donald Hofer, Josef Michl, John Downing

Journal:

Polymer Engineering & Science

Year:

1983

Language:

english

File:

PDF, 663 KB

english, 1983

5

Density estimation for small mammals from livetrapping grids: rodents in northern Canada

Charles J. Krebs, Rudy Boonstra, Scott Gilbert, Donald Reid, Alice J. Kenney, Elizabeth J. Hofer and Drik H. Van Vuren

Journal:

Journal of Mammalogy

Year:

2011

Language:

english

File:

PDF, 1.44 MB

english, 2011

6

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Wallow, Thomas I., Brock, Phillip J., Di Pietro, Richard A., Allen, Robert D., Opitz, Juliann, Sooriyakumaran, Ratnam, Hofer, Donald C., Mewherter, Ann M., Cui, Yuping, Yan, Wendy, Worth, G., Moreau,

Year:

1999

Language:

english

File:

PDF, 1.31 MB

english, 1999

7

193nm Photoresist R&D The Risk & Challenge

Hofer, Donald C., Allen, Robert, Wallraff, Greg, Ito, Hiroshi, Breyta, Greg, Brock, Phil, DiPietro, Rick, Conley, Will

Journal:

Journal of Photopolymer Science and Technology

Year:

1996

Language:

english

File:

PDF, 575 KB

english, 1996

8

The epidemiologic transition in a frontier town — Manti, Utah: 1849–1977

Catherine Hofer Levison, Donald W. Hastings, Jerry N. Harrison

Journal:

American Journal of Physical Anthropology

Year:

1981

Language:

english

File:

PDF, 938 KB

english, 1981

9

Letters to the editor

Myron A. Hofer, Scott R. Robinson, Donald J. Stehouwer, Arnold J. Mandell, Karen A. Selz

Journal:

Developmental Psychobiology

Year:

1995

Language:

english

File:

PDF, 487 KB

english, 1995

10

Staphylococcal Toxins Augment Specific IgE Responses by Atopic Patients Exposed to Allergen

Hofer, Michael F., Harbeck, Ronald J., Schlievert, Patrick M., Leung, Donald Y. M.

Journal:

The Journal of Investigative Dermatology

Year:

1999

Language:

english

File:

PDF, 382 KB

english, 1999

11

Organosilane high polymers: Synthesis of formable homopolymers

Peter Trefonas III, Peter I. Djurovich, Xing-Hua Zhang, Robert West, Robert D. Miller, Donald Hofer

Journal:

Journal of Polymer Science Part C: Polymer Letters

Year:

1983

Language:

english

File:

PDF, 188 KB

english, 1983

12

Synthesis and characterization of phenylquinoxaline-arylene ester block copolymers

Jeff W. Labadie, James L. Hedrick, Donald C. Hofer

Journal:

Polymer Bulletin

Year:

1987

Language:

english

File:

PDF, 330 KB

english, 1987

13

Solid state properties of phenylquinoxaline-arylene ester copolymers

James L. Hedrick, Jeff W. Labadie, Donald C. Hofer

Journal:

Polymer Bulletin

Year:

1987

Language:

english

File:

PDF, 335 KB

english, 1987

14

Modulatory Effects of Staphylococcal Superantigen TSST-1 on IGE Synthesis in Atopic Dermatitis

Mitchell R. Lester, Michael F. Hofer, Harald Renz, Anne E. Trumble, Erwin W. Gelfand, Donald Y.M. Leung

Journal:

Clinical Immunology and Immunopathology

Year:

1995

File:

PDF, 408 KB

1995

15

Lemming winter habitat choice: a snow-fencing experiment

Donald G. Reid, Frédéric Bilodeau, Charles J. Krebs, Gilles Gauthier, Alice J. Kenney, B. Scott Gilbert, Maria C.-Y. Leung, David Duchesne, Elizabeth Hofer

Journal:

Year:

2012

Language:

english

File:

PDF, 380 KB

english, 2012

16

Staging non—small cell lung cancer by whole-body positron emission tomographic imaging

Peter E. Valk, Thomas R. Pounds, Donald M. Hopkins, Michael K. Haseman, Glenn A. Hofer, Hani B. Greiss, Richard W. Myers, Calvin L. Lutrin

Journal:

The Annals of Thoracic Surgery

Year:

1995

Language:

english

File:

PDF, 1.68 MB

english, 1995

17

Noninvasive predictors of sudden cardiac death in men with coronary heart disease: Predictive value of maximal stress testing

Robert A. Bruce, Timothy DeRouen, Donald R. Peterson, John B. Irving, Nina Chinn, Barbara Blake, Verona Hofer

Journal:

The American Journal of Cardiology

Year:

1977

Language:

english

File:

PDF, 823 KB

english, 1977

18

Upregulation of B7.2, but not B7.1, on B cells from patients with allergic asthma

Hofer, Michaël F., Jirapongsananuruk, Orathai, Trumble, Anne E., Leung, Donald Y.M.

Journal:

Journal of Allergy and Clinical Immunology

Year:

1998

Language:

english

File:

PDF, 203 KB

english, 1998

19

Poly( l -lysine)- g -Poly(ethylene glycol) Layers on Metal Oxide Surfaces: Attachment Mechanism and Effects of Polymer Architecture on Resistance to Protein Adsorption †

Kenausis, Gregory L., Vörös, Janos, Elbert, Donald L., Huang, Ningping, Hofer, Rolf, Ruiz-Taylor, Laurence, Textor, Marcus, Hubbell, Jeffrey A., Spencer, Nicholas D.

Journal:

Journal of Physical Chemistry B

Year:

2000

Language:

english

File:

PDF, 195 KB

english, 2000

20

Poly( l -lysine)- g -poly(ethylene glycol) Layers on Metal Oxide Surfaces: Surface-Analytical Characterization and Resistance to Serum and Fibrinogen Adsorption

Huang, Ning-Ping, Michel, Roger, Voros, Janos, Textor, Marcus, Hofer, Rolf, Rossi, Antonella, Elbert, Donald L., Hubbell, Jeffrey A., Spencer, Nicholas D.

Journal:

Year:

2001

Language:

english

File:

PDF, 127 KB

english, 2001

21

Acetylene-terminated polyimide cure studies using carbon-13 magic-angle spinning NMR on isotopically labeled samples

Swanson, Sally A., Fleming, William W., Hofer, Donald C.

Journal:

Year:

1992

Language:

english

File:

PDF, 728 KB

english, 1992

22

Differential Effects of Staphylococcal Toxic Shock Syndrome Toxin-1 on B Cell Apoptosis

Michaël F. Hofer, Karen Newell, Richard C. Duke, Patrick M. Schlievert, John H. Freed and Donald Y. M. Leung

Journal:

Proceedings of the National Academy of Sciences

Year:

1996

Language:

english

File:

PDF, 1.00 MB

english, 1996

23

8-Substituted Analogues of 3-(3-Cyclopentyloxy-4-methoxy-benzyl)-8-isopropyl- adenine: Highly Potent and Selective PDE4 Inhibitors

Whitehead, John W. F., Lee, Gary P., Gharagozloo, Parviz, Hofer, Peter, Gehrig, André, Wintergerst, Peter, Smyth, Donald, McCoull, William, Hachicha, Mohamed, Patel, Aniket, Kyle, Donald J.

Journal:

Journal of Medicinal Chemistry

Year:

2005

Language:

english

File:

PDF, 108 KB

english, 2005

24

Density estimation for small mammals from livetrapping grids: rodents in northern Canada

Krebs, Charles J., Boonstra, Rudy, Gilbert, Scott, Reid, Donald, Kenney, Alice J., Hofer, Elizabeth J.

Journal:

Journal of Mammalogy

Year:

2011

Language:

english

File:

PDF, 524 KB

english, 2011

25

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R., Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.23 MB

english, 1995

26

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Wallow, Thomas I., Brock, Phillip J., Di Pietro, Richard A., Allen, Robert D., Opitz, Juliann, Sooriyakumaran, Ratnam, Hofer, Donald C., Meute, Jeff, Byers, Jeff D., Rich, Georgia K., McCallum, Martin

Year:

1998

Language:

english

File:

PDF, 739 KB

english, 1998

27

SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Advances in Resist Technology and Processing II - Modeling Planarization With Polymers

LaVergne, Debra B., Hofer, Donald C., Thompson, Larry F.

Year:

1985

Language:

english

File:

PDF, 6.87 MB

english, 1985

28

An Apparatus for Generating Aged Cigarette Smoke for Controlled Human Exposure Studies

Schick, Suzaynn F., Farraro, Kathryn F., Fang, Jiaxi, Nasir, Sarah, Kim, Justin, Lucas, Donald, Wong, Hofer, Balmes, John, Giles, D. Ken, Jenkins, Bryan

Journal:

Aerosol Science & Technology

Year:

2012

Language:

english

File:

PDF, 336 KB

english, 2012

29

Effect of Aerosolized Anti-IgE (E25) on Airway Responses to Inhaled Allergen in Asthmatic Subjects

FAHY, JOHN V., COCKCROFT, DONALD W., BOULET, LOUIS-PHILIPPE, WONG, HOFER H., DESCHESNES, FRANCINE, DAVIS, ELIZABETH E., RUPPEL, JANE, SU, JOHN Q., ADELMAN, DANIEL C.

Journal:

American Journal of Respiratory and Critical Care Medicine

Year:

1999

Language:

english

File:

PDF, 141 KB

english, 1999

30

SPIE Proceedings [SPIE 1984 Microlithography Conferences - Santa Clara (Monday 12 March 1984)] Advances in Resist Technology I - Polysilane Bilayer uv Lithography

Hofer, Donald C., Miller, Robert D., Willson, C.Grant, Willson, C. Grant

Year:

1984

Language:

english

File:

PDF, 8.50 MB

english, 1984

31

SPIE Proceedings [SPIE Lasers and Applications in Science and Engineering - San Jose, CA (Saturday 21 January 2006)] Fiber Lasers III: Technology, Systems, and Applications - Spectral combining of fiber lasers

Röser, F., Klingebiel, S., Liem, A., Schreiber, T., Höfer, S., Limpert, J., Peschel, T., Eberhardt, R., Tünnermann, A., Brown, Andrew J. W., Nilsson, Johan, Harter, Donald J., Tünnermann, Andreas

Year:

2006

Language:

english

File:

PDF, 276 KB

english, 2006

32

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Positive bilayer resists for 248- and 193-nm lithography

Sooriyakumaran, Ratnam, Wallraff, Gregory M., Larson, Carl E., Fenzel-Alexander, Debra, Di Pietro, Richard A., Opitz, Juliann, Hofer, Donald C., LaTulip, Jr., Douglas C., Simons, John P., Petrillo, Ka

Year:

1998

Language:

english

File:

PDF, 1.68 MB

english, 1998

33

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Design of an etch-resistant cyclic olefin photoresist

Allen, Robert D., Opitz, Juliann, Wallow, Thomas I., Di Pietro, Richard A., Hofer, Donald C., Jayaraman, Saikumar, Hullihan, Karen A., Rhodes, Larry F., Goodall, Brian L., Shick, Robert A.

Year:

1998

Language:

english

File:

PDF, 904 KB

english, 1998

34

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Opitz, Juliann, Allen, Robert D., Wallow, Thomas I., Wallraff, Gregory M., Hofer, Donald C.

Year:

1998

Language:

english

File:

PDF, 1.34 MB

english, 1998

35

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - New approaches to production-worthy 193-nm photoresists based on acrylic copolymers

Wallow, Thomas I., Allen, Robert D., Opitz, Juliann, Di Pietro, Richard A., Brock, Phillip J., Sooriyakumaran, Ratnam, Hofer, Donald C.

Year:

1998

Language:

english

File:

PDF, 1.29 MB

english, 1998

36

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Lithographic performance of a positive photoresist for thick-film applications

Renaldo, Alfred F., Lauchlan, Laurie J., Hofer, Donald C., Hinsberg, William D., McKean, Dennis R., Santini, Hugo A., Willson, C. Grant, Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 1.18 MB

english, 1995

37

Carbon-13 chemical shifts of the carbonyl group. V. Observation of a deuterium isotope effect using carbon-13 field-frequency lock

Maciel, Gary E., Ellis, Paul D., Hofer, Donald C.

Journal:

Journal of Physical Chemistry

Year:

1967

Language:

english

File:

PDF, 553 KB

english, 1967

38

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Limits to etch resistance for 193-nm single-layer resists

Kunz, Roderick R., Palmateer, Susan C., Forte, Anthony R., Allen, Robert D., Wallraff, Gregory M., Di Pietro, Richard A., Hofer, Donald C., Kunz, Roderick R.

Year:

1996

Language:

english

File:

PDF, 773 KB

english, 1996

39

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Approaches to etch-resistant 193-nm photoresists: performance and prospects

Allen, Robert D., Opitz, Juliann, Ito, Hiroshi, Wallow, Thomas I., Casmier, Daniel V., Di Pietro, Richard A., Brock, Phillip J., Breyta, Gregory, Sooriyakumaran, Ratnam, Larson, Carl E., Hofer, Donald

Year:

1999

Language:

english

File:

PDF, 1.27 MB

english, 1999

40

SPIE Proceedings [SPIE 1984 Microlithography Conferences - Santa Clara (Monday 12 March 1984)] Advances in Resist Technology I - Contrast Enhanced UV Lithography With Polysilanes

Hofer, Donald C., Miller, Robert D., Willson, C.Grant, Neureuther, Andrew R., Willson, C. Grant

Year:

1984

Language:

english

File:

PDF, 4.15 MB

english, 1984

41

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Polymer-platform-dependent characteristics of 193-nm photoresists

Opitz, Juliann, Allen, Robert D., Breyta, Gregory, Hofer, Donald C., Sundararajan, Narayan, Ober, Christopher K., Conley, Will

Year:

1999

Language:

english

File:

PDF, 1.71 MB

english, 1999

42

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)

Varanasi, Pushkara R., Maniscalco, J., Mewherter, Ann M., Lawson, Margaret C., Jordhamo, George M., Allen, Robert D., Opitz, Juliann, Ito, Hiroshi, Wallow, Thomas I., Hofer, Donald C., Langsdorf, Leah

Year:

1999

Language:

english

File:

PDF, 2.24 MB

english, 1999

43

SPIE Proceedings [SPIE Optoelectronics '99 - Integrated Optoelectronic Devices - San Jose, CA (Saturday 23 January 1999)] Commercial and Biomedical Applications of Ultrafast Lasers - Fiber lasers in ultrafast optics

Fermann, Martin E., Sucha, Gregg D., Galvanauskes, Almantas, Hofer, Martin, Harter, Donald J., Reed, Murray K., Neev, Joseph

Year:

1999

Language:

english

File:

PDF, 1.93 MB

english, 1999

44

SPIE Proceedings [SPIE Lasers and Applications in Science and Engineering - San Jose, CA (Saturday 21 January 2006)] Fiber Lasers III: Technology, Systems, and Applications - Q-switching of Yb-doped double-clad fiber laser using micro-optical waveguide on micro-actuating platform modulator for marking applications

Jeong, Yunsong, Brown, Andrew J. W., Nilsson, Johan, Liem, Andreas, Mörl, Klaus, Harter, Donald J., Tünnermann, Andreas, Höfer, Sven, Kim, Youngbok, Tünnermann, Andreas, Oh, Kyunghwan

Year:

2006

Language:

english

File:

PDF, 587 KB

english, 2006

45

SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Influence of acid generator structure on T-top formation in high-temperature bake processes for environmental stabilization

Ito, Hiroshi, Breyta, Gregory, Hofer, Donald C., Fischer, Thomas, Prime, R. Bruce, Allen, Robert D.

Year:

1995

Language:

english

File:

PDF, 826 KB

english, 1995

46

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Molecular weight tailoring in methacrylate 193-nm photoresists

Wallow, Thomas I., Brock, Phillip J., Truong, Hoa D., Allen, Robert D., Opitz, Juliann, Hofer, Donald C., Conley, Will

Year:

1999

Language:

english

File:

PDF, 1.24 MB

english, 1999

47

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Protecting groups for 193-nm photoresists

Allen, Robert D., Sooriyakumaran, Ratnam, Opitz, Juliann, Wallraff, Gregory M., Di Pietro, Richard A., Breyta, Gregory, Hofer, Donald C., Kunz, Roderick R., Jayaraman, Saikumar, Shick, Robert A., Good

Year:

1996

Language:

english

File:

PDF, 479 KB

english, 1996

48

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Role of photoacid structure on the performance of 193-nm resists

Allen, Robert D., Tarascon-Auriol, Regine G., Opitz, Juliann, Larson, Carl E., Di Pietro, Richard A., Breyta, Gregory, Hofer, Donald C.

Year:

1997

Language:

english

File:

PDF, 724 KB

english, 1997

49

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Sooriyakumaran, Ratnam, Houlihan, Francis M., Fenzel-Alexander, Debra, Brock, Phillip J., Larson, Carl E., Di Pietro, Richard A., Wallraff, Gregory M., Hofer, Donald C., Dawson, Dan J., Mahorowala, Ar

Year:

2000

Language:

english

File:

PDF, 1.54 MB

english, 2000

50

Lemming winter habitat choice: a snow-fencing experiment

Donald G. Reid, Frédéric Bilodeau, Charles J. Krebs, Gilles Gauthier, Alice J. Kenney, B. Scott Gilbert, Maria C.-Y. Leung, David Duchesne and Elizabeth Hofer

Journal:

Year:

2012

Language:

english

File:

PDF, 1.97 MB

english, 2012

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@z-lib.do

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски